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Dipartimento di Fisica - Politecnico di Milano

Crescita e caratterizzazione di film sottili nanostrutturati di ossido di tungsteno per fotonica e plasmonica

Tungsten Oxide WO3-x is a wide-bandgap semiconductor, whose electronic and optical properties can be broadly tuned, by acting on its stoichiometry and crystalline phase, in dependence on the growth method. In its nanostructured forms, it appeals to a large number of promising applications, ranging from electrochromism to photoelectrochemistry, to photocatalysis and sensing.

The Thesis will be devoted to the experimental characterization of thin films and multilayers of amorphous WO3-x, also doped with metallic nanocrystals, in view of advanced applications in the field of plasmonic sensors.

WO3-x layers will be grown by RF sputtering technique and characterized in terms of their morphology, structure, composition, as well as from the point of view of their dielectric and optical response in the UV-VIS-near IR range. Dielectric properties at the nanoscale and plasmonic resonance behavior will also be investigated. Experimental results will be discussed and compared to theoretical models.