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Dipartimento di Fisica - Politecnico di Milano

Ossido di tungsteno per fotonica e plasmonica

Subject of the Thesis: Experimental characterization of thin films and multilayers of amorphous WO3-x, also doped with metallic nanocrystals, for charge selective transparent conductive oxides and advanced sensing applications. Design of WO3-x related plasmonic structures.

Activity: Tungsten Oxide WO3‐x is a wide‐bandgap semiconductor, whose electronic and optical properties can be broadly tuned from dielectric to metal-like behavior, by acting on its stoichiometry and crystalline phase, in dependence on the growth method. In its nanostructured forms it appeals to a large number of promising applications, ranging from photoelectrochemistry and photocatalysis, to charge selective contacts for solar cells and sensing.

WO3-x layers will be grown by RF sputtering technique and characterized in terms of their morphology, structure, composition, as well as from the point of view of their dielectric and optical response in the UV‐VIS‐near IR range. Dielectric properties at the nanoscale and plasmonic resonance behavior will also be investigated. Experimental results will be discussed and compared to theoretical models.

Preferential skills: Notions of materials science and dielectric and electronic properties of materials and optics. Attitude and interest for numerical modelling and design. The candidate will be trained in the use of specific software, when needed.



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